Zirconium silicide refers primarily to the compound ZrSi₂, a material of significant interest in advanced technology applications. It belongs to the class of transition metal silicides, formed from zirconium and silicon. This compound typically appears as a dark gray to black crystalline solid. Its defining characteristic is excellent thermal stability, with a very high melting point exceeding 1600°C, making it suitable for high-temperature environments.

(zirconium silicide)

Electrically, zirconium silicide exhibits metallic conductivity, specifically behaving as an n-type conductor. This conductivity, combined with its thermal robustness, positions it as a valuable material within the semiconductor industry. A key application is in the fabrication of integrated circuits. ZrSi₂ is particularly useful as a contact material and gate electrode in CMOS transistors, especially for the nMOSFET source and drain contacts. Its compatibility with standard silicon processing techniques is a major advantage. Furthermore, it demonstrates good etch selectivity against silicon dioxide and polysilicon, simplifying certain manufacturing steps.

(zirconium silicide)

Beyond microelectronics, zirconium silicide finds use in thin-film coatings and as a potential thermoelectric material due to its favorable electrical properties and thermal stability, though research in this area is ongoing. Its hexagonal crystal structure contributes to its unique properties. Handling requires caution, as zirconium silicide powder can be pyrophoric, igniting spontaneously in air. Therefore, appropriate safety measures are essential during processing. In summary, ZrSi₂ is a critical material leveraging high-temperature resilience and electrical conductivity for demanding semiconductor and electronic applications.
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